Plasma treatment helps reveal how molecular coatings dope silicon
Controlling dopant concentration near the silicon surface is increasingly important for ultrashallow junctions and nanoscale devices. Mixed monolayer doping (MMLD) offers a surface-chemistry-based approach in which dopant-containing molecules are mixed with nondopant molecules to
Controlling dopant concentration near the silicon surface is increasingly important for ultrashallow junctions and nanoscale devices. Mixed monolayer doping (MMLD) offers a surface-chemistry-based approach in which dopant-containing molecules are mixed with nondopant molecules to This story matters for Science & Discovery readers tracking science. Reported by phys.org. Read the full original at the source link below.
Originally reported by phys.org. LearningWire.com curates and briefs the science & discovery stories that matter. Our editorial policy →
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